Automated Metrology for Semiconductors

As semiconductor devices shrink in feature size and grow in complexity, the need for fast, precise, and repeatable metrology is critical. Traditional inspection workflows struggle to deliver the throughput and consistency required in modern fabrication. This talk explores how ZEISS is advancing automated metrology to address these challenges and enable reliable process control.

We highlight how automation across data acquisition, analysis, and integration reduces operator dependency while improving measurement repeatability and speed. Emphasis will be placed on correlative, multi-modal workflows that combine techniques such as electron and X-ray microscopy to deliver insight into both surface and subsurface structures.

By embedding metrology directly into process feedback loops, automated solutions help reduce variability, improve yield, and accelerate development cycles. Automated metrology is therefore not just a productivity enhancement, but a fundamental enabler for maintaining control and confidence at advanced semiconductor nodes.

Biography

Andrew Elliott is the Business Development and Applications Lead for the Electronics and Materials Science sectors at Carl Zeiss Ltd. He specialises in advanced imaging systems—including light microscopes, electron microscopes, and X ray CT—and in translating these technologies into effective failure analysis workflows. This expertise positions him well to contribute to the ongoing direction of the NMI via the SSG and FACTYR working groups. Outside his role at ZEISS, Andrew holds a PhD in engineering and a Master’s degree in chemistry, both from the University of Leicester.